RS-HMDA HEXAMETHYLDISILAZANE CAS #: 999-97-3
Nānā nui
Nā kikoʻī wikiwiki
- Hoʻokaʻawale:
- Agena Kokua Kimia
- Helu CAS:
- 999-97-3
- Nā inoa ʻē aʻe:
- RS-HMDA
- MF:
- C6H19NSi2
- EINECS Helu.:
- 213-668-5
- Maʻemaʻe:
- 99 MIN
- Kahi i kumu:
- Zhejiang, Kina
- ʻAno:
- Adsorbent
- ʻAno Adsorbent:
- Kalapona Ho'ā
- Hoʻohana:
- Na Agena Kokua Plastic, Na Agena Kokua Rubber, Na Agena Kokua Textile
- Kapa inoa:
- RS
- Helu kumu hoʻohālike:
- RS-HMDA
Hōʻike huahana
Hexamethyldisilazane ʻike kumu CAS No. 999-97-3:
| inoa mea kūʻai | Hexamethyldisilazane |
| Nā huaʻōlelo like | ((CH3)3Si)2NH;1,1,1,3,3,3-hexamethyl-disilazan;1,1,1-trimethyl-n-(trimethylsilyl)-silaamin;Disilazane, 1,1,1,3,3,3-hexamethyl-;hexamethyldisilazane(hmds);hexamethylsilazane;sz6079;Trimethyl-N-(trimethylsilyl)silanamine |
| CAS | 999-97-3 |
| MF | C6H19NSi2 |
| MW | 161.39 |
| EINECS | 213-668-5 |
| Māhele Huahana | ʻO Pharmaceucleosides, Nucleotides & Related Reagents;Nā Agena Pale no nā Pūʻulu Hydroxyl a me Amino;Nā Agena Palekana, Nā ʻĀpana Phosphorylating & Nā ʻĀpana Hoʻopā;Si (Nā Papa o nā Hui Silika);Silazanes;Nā Hui Silika (no ka Synthesis);Silylation (GC Derivatizing Reagents);Huina Si-N;Kemika Organic Synthetic;Trimethylsilylation (GC Derivatizing Reagents);Na Agena Pale; |
Hexamethyldisilazane Kimia Waiwai CAS No.999-97-3:
| Lae hehee | -78 °C |
| Lae paila | 125 °C(māmā) |
| mānoanoa | 0.774 g/mL ma 25 °C(kukui.) |
| Fp | 57.2 °F |
| ka mahana mālama. | 2-8°C |
| hikiwawe | Hiki ke hui pū me ka acetone, benzene, ethyl ether, heptane a me perchlorethylene. |
| pka | 30 (ma 25 ℃) |
| ʻO Merck | 14,4689 |
| palena pahū | 0.8-25.9%(V) |
| Hiki i ka wai | HANA |
| Pilikino | ʻAiʻoniʻoni |
Nā noi
Hiki ke hoʻohana ʻia ʻo Siloxane RS-HMDA i nā ʻano noi like ʻole, me:
E like me ka mea nui silylating agent (introduction o ka tri-methylsilyl group) manafactures o
nā lāʻau lapaʻau, e like me ka amikacin, penicillin a me nā derivatives, etc.,
E like me nā mea lapaʻau ʻili no ka diatomite, silica a me ka pauka titanium;
Ma ke ʻano he mea hana no ka synthesis organik kūikawā;
E like me ke kōkua cohesive no nā mea hana etching māmā i ka ʻoihana semiconductor.
Hōʻike
Hoʻopili a me ka hoʻouna ʻana
210L pahu hao: 200KG / pahu
1000L IBC pahu: 1000KG / pahu
E kākau i kāu leka ma aneʻi a hoʻouna mai iā mākou